MBE systems
KT-MBE-300
Molecular beam epitaxy (MBE) system
A research MBE system for millimeter-scale samples. The 250 mm chamber houses a four-axis heater stage and up to 12 sources, with optional RHEED, QCM, RGA, and load-lock.
Features
- Built for 10 mm × 10 mm samples and smaller
- Optional LN2 cryoshroud, source shutters, and shared water cooling
- LN2 sample cooling for low-temperature growth
- Programmed growth with interlock protection
- Can add analysis chambers later
Specifications
| Parameter | Value |
|---|---|
| Main chamber | |
| Sample size | Up to 10 mm × 10 mm |
| Chamber diameter | 250 mm |
| Base pressure | < 2×10⁻¹⁰ mbar |
| Base pressure with LN2 shroud | < 5×10⁻¹¹ mbar |
| Source ports | 12 (DN40CF / DN63CF) |
| Bake temperature | 150 °C |
| Four-axis heater | |
| Heating | Direct / indirect |
| Indirect heater | Encapsulated PBN |
| Maximum temperature | 1400 °C direct / 600 °C indirect |
| Substrate rotation | 360° continuous (differential pumping) |
| Sample cooling | Liquid nitrogen |
| X/Y travel | ±12.5 mm |
| Z travel | 0–150 mm |
| Load-lock | |
| Base pressure | < 2×10⁻⁸ mbar |
| Sample storage | 3 |